Objective We propose a step change in the way plasma etching processes are controlled, through understanding, measuring and controlling the key parameters determining the environment experienced by a processed substrate. We will use simulation, experiments and innovative plasma processing concepts to demonstrate robust PLASMA ETCHING OF NANO-SCALE FEATURES as well as CONTROLLED SURFACE NANO-ROUGHNESS and texture. We will use a multi-level nested approach for the understanding and optimisation of plasma processing for nanotechnology: The first level is the plasma tool and the gas phase plasma state, the second level is the surface and the features being etched, while the third level is the nano-texture and nano-roughness of the surfaces and features etched. A feedback loop will be developed to optimise simultaneously all levels of the nano-scale etching This will greatly improve the ability, especially of SMEs, to achieve reliable fabrication of nano-devices in small batch development, and in the scale-up to larger production quantities. Fields of science engineering and technologyelectrical engineering, electronic engineering, information engineeringinformation engineeringtelecommunicationsradio technologyradio frequencyengineering and technologyelectrical engineering, electronic engineering, information engineeringelectronic engineeringcontrol systemsengineering and technologynanotechnologynatural scienceschemical sciencesinorganic chemistrymetalloidsnatural sciencescomputer and information sciencessoftwaresoftware applicationssimulation software Programme(s) FP6-NMP - Nanotechnologies and nanosciences, knowledge-based multifunctional materials and new production processes and devices: thematic priority 3 under the 'Focusing and integrating community research' of the 'Integrating and strengthening the European Research Area' specific programme 2002-2006. Topic(s) NMP-2004-IST-NMP-3 - Materials, Equipment and Processes for Production of Nano-Photonic and Nano-Electronic Devices Call for proposal FP6-2004-IST-NMP-2 See other projects for this call Funding Scheme STREP - Specific Targeted Research Project Coordinator OXFORD INSTRUMENTS PLASMA TECHNOLOGY LTD EU contribution No data Address Old Station Way, Eynsham WITNEY OXFORDSHIRE United Kingdom See on map Total cost No data Participants (5) Sort alphabetically Sort by EU Contribution Expand all Collapse all TECHNISCHE UNIVERSITAET ILMENAU Germany EU contribution No data Address Max-Planck-Ring 14 100565 ILMENAU See on map Links Website Opens in new window Total cost No data DUBLIN CITY UNIVERSITY Ireland EU contribution No data Address Glasvenin DUBLIN See on map Links Website Opens in new window Total cost No data NATIONAL CENTER FOR SCIENTIFIC RESEARCH "DEMOKRITOS" Greece EU contribution No data Address Terma (End of Street) Patriarchou Gregoriou Str. P.O. Box 60228 AGHIA PARASKEVI See on map Links Website Opens in new window Total cost No data S3SOLUTIONS GMBH Germany EU contribution No data Address Sollachweg 9 WESSLING See on map Links Website Opens in new window Total cost No data ISMA LTD Bulgaria EU contribution No data Address Samokovsko Shosse 2 SOFIA See on map Total cost No data
