The TOCHA project represents the first internationally EU coordinated multi-physics consortium on topological matter and its application in interconnects and quantum metrology. Because of the very early state of research into topological matter and on ferromagnetic topological insulators, topological photonics and topological phononics, significant impact in the fundamental understanding of these systems has been achieved.
The work carried out by the consortium is beyond the state of the art in several fronts. Some examples include a world record in resistance standard at zero magnetic field, the improvement of the signal to noise ratio in quantum resistance metrology-grade measurements, novel approaches to investigate spin textures in topological materials and new opportunities for topological devices, making use of ballistic chiral transport. In bosonic (photonic/phononic) systems, the consortium has demonstrated novel designs of planar topological waveguides, the co-localization of topological photons and phonons, and the emission of path-entangled photons from a single emitter. The potential advantages of topological protection to disorder, in comparison to conventional waveguides, and means to quantify it, have been established, while new models to analyse the robustness of light transport in fully-three-dimensional photonic nanostructures, and open access codes, have been developed.
The technology and know-how resulting from TOCHA could radically change our view of Information and Communication Technologies and Metrology, specifically by offering:
i) Novel solutions to transfer information with low dissipation.
ii) Topology in nano-photonics and -phononics devices, which are expected to significantly improve their performance and bring new functionalities.
iii) New techniques to control photon-phonon coupling, which is of paramount importance not only in the quantum regime but also for optomechanics.
iv) Novel approaches to quantum resistance standards for metrology, which might represent the first concrete application of topological insulators.