Objectif - To establish sequential processes including rapid thermal clean (RTC), DRAM or EEPROM stack (Rapid Thermal Oxidation/Nitration: RTO/N) and rapid CVD of doped poly or nitride (RTCVD).- To examine technical processes, equipment economics (CoO) and reliability for the hot processing cluster-tool.- To compare technological performance and economics of the cluster tool with standard batch processing.The performance of a four port hot cluster delivered by ASMI (platform and CVD modules) and by AST (RTP modules) will be assessed at SIEMENS in Munich. The final goal is to demonstrate technological superiority of clustered single wafer processing of very thin films over batch processes. This should lead to competitive cost of ownership figures even with lower throughput for single wafer processing. Champ scientifique social scienceseconomics and businesseconomicsnatural scienceschemical scienceselectrochemistryelectrolysisengineering and technologymaterials engineeringcoating and films Programme(s) FP4-ESPRIT 4 - Specific research and technological development programme in the field of information technologies, 1994-1998 Thème(s) 2.9 - Building blocks, methods & tools for semiconductor app&techs Appel à propositions Data not available Régime de financement ACM - Preparatory, accompanying and support measures Coordinateur Siemens Ag, Semiconductor Group Contribution de l’UE Aucune donnée Adresse Balanstrasse 73 81541 Muenchen Allemagne Voir sur la carte Coût total Aucune donnée
